Er-carrier interaction and its effects on the Er3+ luminescence of erbium-doped Si/SiO2 superlattices

被引:24
作者
Shin, JH
Jhe, JH
Seo, SY
Ha, YH
Moon, DW
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
[2] Korea Res Inst Stand & Sci, Surface Anal Grp, Taejon 305606, South Korea
关键词
D O I
10.1063/1.126740
中图分类号
O59 [应用物理学];
学科分类号
摘要
The Er-carrier interaction and its effects on the Er3+ photoluminescence properties of erbium-doped Si/SiO2 superlattices are investigated. The interaction between the erbium atoms and the electronic carriers was controlled by doping erbium into the SiO2 layers only and by depositing buffer layers of pure SiO2 between the erbium-doped SiO2 layers and the Si layers. We demonstrate that by controlling the erbium-carrier interaction, a three orders of the magnitude enhancement of the Er3+ luminescence intensity and a nearly complete suppression of the temperature-induced quenching of Er3+ luminescence can be achieved while still allowing the Er3+ ions to be excited by the carriers. We identify the asymmetry between the dominant carrier-mediated excitation and the de-excitation paths of Er3+ ions as the possible cause for the observed effects. (C) 2000 American Institute of Physics. [S0003-6951(00)02324-X].
引用
收藏
页码:3567 / 3569
页数:3
相关论文
共 14 条
[1]   Effects of hydrogen plasma treatment on the 1.54 μm luminescence of erbium-doped porous silicon [J].
Dejima, T ;
Saito, R ;
Yugo, S ;
Isshiki, H ;
Kimura, T .
JOURNAL OF APPLIED PHYSICS, 1998, 84 (02) :1036-1040
[2]   1.54-MU-M LUMINESCENCE OF ERBIUM-IMPLANTED III-V SEMICONDUCTORS AND SILICON [J].
ENNEN, H ;
SCHNEIDER, J ;
POMRENKE, G ;
AXMANN, A .
APPLIED PHYSICS LETTERS, 1983, 43 (10) :943-945
[3]   ROOM-TEMPERATURE ELECTROLUMINESCENCE FROM ER-DOPED CRYSTALLINE SI [J].
FRANZO, G ;
PRIOLO, F ;
COFFA, S ;
POLMAN, A ;
CARNERA, A .
APPLIED PHYSICS LETTERS, 1994, 64 (17) :2235-2237
[4]   1.54 mu m photoluminescence of Er3+ doped into SiO2 films containing Si nanocrystals: Evidence for energy transfer from Si nanocrystals to Er3+ [J].
Fujii, M ;
Yoshida, M ;
Kanzawa, Y ;
Hayashi, S ;
Yamamoto, K .
APPLIED PHYSICS LETTERS, 1997, 71 (09) :1198-1200
[5]   Excitation and deexcitation of Er3+ in crystalline silicon [J].
Kik, PG ;
deDood, MJA ;
Kikoin, K ;
Polman, A .
APPLIED PHYSICS LETTERS, 1997, 70 (13) :1721-1723
[6]   Photoluminescence properties of surface-oxidized Ge nanocrystals: Surface localization of excitons [J].
Okamoto, S ;
Kanemitsu, Y .
PHYSICAL REVIEW B, 1996, 54 (23) :16421-16424
[7]   Electroluminescence of erbium-doped silicon [J].
Palm, J ;
Gan, F ;
Zheng, B ;
Michel, J ;
Kimerling, LC .
PHYSICAL REVIEW B, 1996, 54 (24) :17603-17615
[8]   Excitation and nonradiative deexcitation processes of Er3+ in crystalline Si [J].
Priolo, F ;
Franzo, G ;
Coffa, S ;
Carnera, A .
PHYSICAL REVIEW B, 1998, 57 (08) :4443-4455
[9]   Synchronized swinging of electroluminescence intensity and peak wavelength with Si layer thickness in Au/SiO2/nanometer Si/SiO2/p-Si structures [J].
Qin, GG ;
Wang, YQ ;
Qiao, YP ;
Zhang, BR ;
Ma, ZC ;
Zong, WH .
APPLIED PHYSICS LETTERS, 1999, 74 (15) :2182-2184
[10]   Optical measurement of narrow band rare-earth 4f levels with energies greater than the band gap of the host [J].
Schweizer, T ;
Mobert, PEA ;
Hector, JR ;
Hewak, DW ;
Brocklesby, WS ;
Payne, DN ;
Huber, G .
PHYSICAL REVIEW LETTERS, 1998, 80 (07) :1537-1540