Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

被引：636

作者：

Bang, Joona ^{[3
]}

Jeong, Unyong ^{[4
]}

Ryu, Du Yeol ^{[5
]}

Russell, Thomas P. ^{[1
]}

Hawker, Craig J. ^{[2
]}

机构：

[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA

[2] Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA

[3] Korea Univ, Dept Chem & Biol Engn, Seoul 136713, South Korea

[4] Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea

[5] Yonsei Univ, Dept Chem Engn, Seoul 120749, South Korea

来源：

ADVANCED MATERIALS | 2009年 / 21卷 / 47期

基金：

美国国家科学基金会;

关键词：

SYMMETRIC DIBLOCK COPOLYMER; ELECTRIC-FIELD ALIGNMENT; POLYSTYRENE-BLOCK-POLY(ETHYLENE OXIDE) MICELLES; SURFACE-INDUCED ORIENTATION; NANOPOROUS THIN-FILMS; NOBLE-METAL COLLOIDS; SINGLE-LAYER FILMS; LONG-RANGE ORDER; PS-B-PMMA; MICRODOMAIN ORIENTATION;

D O I：

10.1002/adma.200803302

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

引用

收藏

页码：4769 / 4792

页数：24

相关论文

共 266 条

[1] NEUTRON REFLECTIVITY STUDIES OF THE SURFACE-INDUCED ORDERING OF DIBLOCK COPOLYMER FILMS [J].

ANASTASIADIS, SH ;

RUSSELL, TP ;

SATIJA, SK ;

MAJKRZAK, CF .

PHYSICAL REVIEW LETTERS, 1989, 62 (16) :1852-1855

[2] Enhanced order of block copolymer cylinders in single-layer films using a sweeping solidification front [J].

Angelescu, Dan E. ;

Waller, Judith H. ;

Adamson, Douglas H. ;

Register, Richard A. ;

Chaikin, Paul M. .

ADVANCED MATERIALS, 2007, 19 (18) :2687-+

[3] Shear-induced alignment in thin films of spherical nanodomains [J].

Angelescu, DE ;

Waller, JH ;

Register, RA ;

Chaikin, PM .

ADVANCED MATERIALS, 2005, 17 (15) :1878-+

[4] Macroscopic orientation of block copolymer cylinders in single-layer films by shearing [J].

Angelescu, DE ;

Waller, JH ;

Adamson, DH ;

Deshpande, P ;

Chou, SY ;

Register, RA ;

Chaikin, PM .

ADVANCED MATERIALS, 2004, 16 (19) :1736-+

[5] Templating the patterning of gold nanoparticles using a stained triblock copolymer film surface [J].

Ansari, IA ;

Hamley, IW .

JOURNAL OF MATERIALS CHEMISTRY, 2003, 13 (10) :2412-2413

[6] Synthesis and characterization of noble metal colloids in block copolymer micelles [J].

Antonietti, M ;

Wenz, E ;

Bronstein, L ;

Seregina, M .

ADVANCED MATERIALS, 1995, 7 (12) :1000-+

[7] Nano-patterning for patterned media using block-copolymer [J].

Asakawa, K ;

Hiraoka, T ;

Hieda, H ;

Sakurai, M ;

Kamata, Y .

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (03) :465-470

[8] Modeling self-assembly and phase behavior in complex mixtures [J].

Balazs, Anna C. .

ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 2007, 58 :211-233

[9] Facile routes to patterned surface neutralization layers for block copolymer lithography [J].

Bang, Joona ;

Bae, Joonwon ;

Lowenhielm, Peter ;

Spiessberger, Christian ;

Given-Beck, Susan A. ;

Russell, Thomas P. ;

Hawker, Craig J. .

ADVANCED MATERIALS, 2007, 19 (24) :4552-+

[10] Effect of humidity on the ordering of PEO-based copolymer thin films [J].

Bang, Joona ;

Kim, Bumjoon J. ;

Stein, Gila E. ;

Russell, Thomas P. ;

Li, Xuefa ;

Wang, Jin ;

Kramer, Edward J. ;

Hawker, Craig J. .

MACROMOLECULES, 2007, 40 (19) :7019-7025

← 1 2 3 4 5 6 7 8 9 10 →