PIII-assisted thin film deposition

被引：28

作者：

Schoser, S

Forget, J

Kohlhof, K

机构：

[1] Robert Bosch GmbH, Corporate Research and Development, Department FV/FLD, D-70049 Stuttgart

来源：

SURFACE & COATINGS TECHNOLOGY | 1997年 / 93卷 / 2-3期

关键词：

plasma immersion ion implantation (PIII); deposition plasma; TiN coatings;

D O I：

10.1016/S0257-8972(97)00072-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A facility for PIII has been designed that utilizes a deposition plasma as an ion source. This combination of PIII and unbalanced magnetron sputtering allows thin TiN layers to be deposited with high structural quality and good adhesion on 100Cr6 ball bearing steel. The results are compared with TIN coatings produced by state of the art unbalanced DC-magnetron sputtering and discussed in terms of hardness, texture and structural properties. (C) 1997 Elsevier Science S.A.

引用

页码：339 / 342

页数：4

共 6 条

[1] A 100 kV 10 a high-voltage pulse generator for plasma immersion ion implantation [J].