Determination of local refractive index variations in thin films by heterodyne interferometric scanning near-field optical microscopy

被引：5

作者：

Diziain, Severine ^{[1
]}

Merolla, Jean-Marc ^{[1
]}

Spajer, Michel ^{[1
]}

Benvenuti, Giacomo ^{[2
]}

Dabirian, Ali ^{[3
]}

Kuzminykh, Yury ^{[3
]}

Hoffmann, Patrik ^{[3
]}

Bernal, Maria-Pilar ^{[1
]}

机构：

[1] Univ Franche Comte, Dept Opt, Inst FEMTO ST, CNRS,UMR6174, F-25030 Besancon, France

[2] ABCD Technol Sarl, CH-1207 Geneva, Switzerland

[3] Ecole Polytech Fed Lausanne, IOA, CH-1015 Lausanne, Switzerland

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2009年 / 80卷 / 09期

关键词：

RESOLUTION; DEPOSITION; AMPLITUDE;

D O I：

10.1063/1.3226660

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We report on a heterodyne interferometric scanning near-field optical microscope developed for characterizing, at the nanometric scale, refractive index variations in thin films. An optical lateral resolution of 80 nm (lambda/19) and a precision smaller than 10(-4) on the refractive index difference have been achieved. This setup is suitable for a wide set of thin films, ranging from periodic to heterogeneous samples, and turns out to be a very promising tool for determining the optical homogeneity of thin films developed for nanophotonics applications. (C) 2009 American Institute of Physics. [doi:10.1063/1.3226660]

引用

页数：4

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