Reproducible hysteresis and resistive switching in metal-CuxO-metal heterostructures

被引:161
作者
Dong, R. [1 ]
Lee, D. S. [1 ]
Xiang, W. F. [1 ]
Oh, S. J. [1 ]
Seong, D. J. [1 ]
Heo, S. H. [1 ]
Choi, H. J. [1 ]
Kwon, M. J. [1 ]
Seo, S. N. [1 ]
Pyun, M. B. [1 ]
Hasan, M. [1 ]
Hwang, Hyunsang [1 ]
机构
[1] Gwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea
关键词
D O I
10.1063/1.2436720
中图分类号
O59 [应用物理学];
学科分类号
摘要
Materials showing reversible resistance switching between high-resistance state and low-resistance state at room temperature are attractive for today's semiconductor technology. In this letter, the reproducible hysteresis and resistive switching characteristics of metal-CuxO-metal (M-CuxO-M) heterostructures driven by low voltages are demonstrated. The fabrication of the M-CuxO-M heterostructures is fully compatible with the standard complementary metal-oxide semiconductor process. The hysteresis and resistive switching behavior are discussed. The good retention characteristics are exhibited in the M-CuxO-M heterostructures by the accurate controlling of the preparation parameters. (c) 2007 American Institute of Physics.
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页数:3
相关论文
共 18 条
[1]   Reproducible switching effect in thin oxide films for memory applications [J].
Beck, A ;
Bednorz, JG ;
Gerber, C ;
Rossel, C ;
Widmer, D .
APPLIED PHYSICS LETTERS, 2000, 77 (01) :139-141
[2]  
Chen A, 2005, INT EL DEVICES MEET, P765
[3]   Resistive switching mechanism of TiO2 thin films grown by atomic-layer deposition -: art. no. 033715 [J].
Choi, BJ ;
Jeong, DS ;
Kim, SK ;
Rohde, C ;
Choi, S ;
Oh, JH ;
Kim, HJ ;
Hwang, CS ;
Szot, K ;
Waser, R ;
Reichenberg, B ;
Tiedke, S .
JOURNAL OF APPLIED PHYSICS, 2005, 98 (03)
[4]   Retention behavior of the electric-pulse-induced reversible resistance change effect in Ag-La0.7Ca0.3MnO3-Pt sandwiches -: art. no. 172107 [J].
Dong, R ;
Wang, Q ;
Chen, LD ;
Shang, DS ;
Chen, TL ;
Li, XM ;
Zhang, WQ .
APPLIED PHYSICS LETTERS, 2005, 86 (17) :1-3
[5]   Thin-film deposition of Cu2O by reactive radio-frequency magnetron sputtering [J].
Ishizuka, S ;
Maruyama, T ;
Akimoto, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2000, 39 (8A) :L786-L788
[6]  
Lee D., 2006, 2006 International Electron Devices Meeting, P1, DOI [10.1109/IEDM.2006.346733, DOI 10.1109/IEDM.2006.346733]
[7]   Electric-pulse-induced reversible resistance change effect in magnetoresistive films [J].
Liu, SQ ;
Wu, NJ ;
Ignatiev, A .
APPLIED PHYSICS LETTERS, 2000, 76 (19) :2749-2751
[8]   Kinetics of copper drift in PECVD dielectrics [J].
Loke, ALS ;
Ryu, C ;
Yue, CP ;
Cho, JSH ;
Wong, SS .
IEEE ELECTRON DEVICE LETTERS, 1996, 17 (12) :549-551
[9]   Properties of high-mobility Cu2O films prepared by thermal oxidation of Cu at low temperatures [J].
Matsumura, H ;
Fujii, A ;
Kitatani, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (11) :5631-5636
[10]   DIFFUSION OF METALS IN SILICON DIOXIDE [J].
MCBRAYER, JD ;
SWANSON, RM ;
SIGMON, TW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (06) :1242-1246