High optical transparency and good adhesion of diamond films deposited on fused silica windows with a surface-wave sustained plasma

被引:10
作者
Airoldi, VT
Borges, CFM
Moisan, M
Guay, D
机构
[1] UNIV MONTREAL, GRP PHYS PLASMAS, MONTREAL, PQ H3C 3J7, CANADA
[2] UNIV QUEBEC, INST NATL RECH SCI ENERGIE & MAT, VARENNES, PQ J3X 1S2, CANADA
来源
APPLIED OPTICS | 1997年 / 36卷 / 19期
关键词
diamond; optical coating; microwave plasma chemical vapor deposition; surface-wave plasma;
D O I
10.1364/AO.36.004400
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We utilized a microwave plasma reactor based on a surface-wave-sustained discharge for uniform coating of fused silica windows with polycrystalline diamond films. Grain size and average roughness as small as 30 and 2.2 nm, respectively, were obtained, resulting in a uniform loss of transparency of only 10% over the 190-800-nm band for as-deposited 1.5-mu m-thick coatings. A pretreatment procedure provides a film coating with a surface resistance to scratching that is approximately a factor of 2 higher than that of bare fused silica. (C) 1997 Optical Society of America.
引用
收藏
页码:4400 / 4402
页数:3
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