Lithographic patterning of photoreactive cell-adhesive proteins

被引：89

作者：

Carrico, Isaac S.

Maskarinec, Stacey A.

Heilshorn, Sarah C.

Mock, Marissa L.

Liu, Julie C.

Nowatzki, Paul J.

Franck, Christian

Ravichandran, Guruswami

Tirrell, David A. ^{[1
]}

机构：

[1] CALTECH, Div Chem & Chem Engn, Pasadena, CA 91125 USA

[2] CALTECH, Div Engn & Appl Sci, Pasadena, CA 91125 USA

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2007年 / 129卷 / 16期

关键词：

D O I：

10.1021/ja070200b

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We describe a novel, simple method for the photolithographic patterning of cell-adhesive proteins. Intrinsically photoreactive proteins are synthesized in Escherichia coli through incorporation of the non-canonical, photosensitive amino acid para-azidophenylalanine. Upon ultraviolet irradiation at 365 nm, proteins form cross-linked films with elastic moduli that can be tuned by varying the concentration of photoreactive amino acid in the expression medium. Films of these proteins can be directly patterned using standard photolithographic techniques. We demonstrate the utility of this method of protein patterning by creating stable arrays of fibroblast cells on an engineered protein "photoresist".

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页码：4874 / +

页数：3

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