CMOS technology for MS/RF SoC

被引:39
作者
Diaz, CH [1 ]
Tang, DD
Sun, J
机构
[1] Taiwan Semicond Mfg Co, Device Engn Div, R&D, Hsinchu 300, Taiwan
[2] Taiwan Semicond Mfg Co, Exploratory Res, R&D, Hsinchu 300, Taiwan
[3] Taiwan Semicond Mfg Co, Log Technol Div, R&D, Hsinchu 300, Taiwan
关键词
1/f noise; analog; analog CMOS; CMOS RF; CMOS system-on-chip (SoC); CMOS technology; device isolation; gate dielectric; gate dielectric direct tunneling; gate patterning; integrated capacitors; integrated inductors; integrated resistors; fine-edge roughness (LER); matching; mechanical stress in MOS devices; mixed-signal (MS); mixed-signal/radio-frequency (MS/RF); noise isolation; passive elements; source-drain engineering; system-on-chip (SoC);
D O I
10.1109/TED.2003.810472
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Accelerated scaling of CMOS technology has contributed to remove otherwise fundamental barriers preempting its widespread application to mixed-signal/radio-frequency (MS/RF) segments. Improvements in device speed, matching, and minimum noise figure are all consistent with fundamental scaling trends. Other figures-of-merit such as linearity and 1/f noise do not scale favorably but are not considered to be roadblocks when viewed from a circuit design perspective. Furthermore, interconnect architectural scaling trends in logic technology have facilitated improvements in passive-component performance metrics. These improvements compounded with innovations in circuit design have made CMOS technology the primary choice for cost driven MS/RF applications. This paper reviews active and passive elements of CMOS MS/RF system-on-chip (SoC) technology from scaling perspective. The paper also discusses the implications that physical phenomena such as mechanical stress and gate leakage as well as gate patterning have on technology definition and characterization.
引用
收藏
页码:557 / 566
页数:10
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