Low temperature analysis of 0.25 μm T-gate strained Si/Si0.55Ge0.45 N-MODFET's

被引:33
作者
Aniel, F [1 ]
Zerounian, N
Adde, R
Zeuner, M
Hackbarth, T
König, U
机构
[1] Univ Paris 11, IEF, CNRS, UMR 8622, F-91405 Orsay, France
[2] Daimler Chrysler Res Ctr, D-89081 Ulm, Germany
关键词
low temperature; microwave devices; modeling; noise; SiGe n-MODFET; silicon compounds;
D O I
10.1109/16.848296
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A low temperature de and HF investigation of 0.25 mu m T-gate Si/Si0.55Ge0.45 n-MODFET's is presented. Outstanding maximum oscillation frequencies f(max) range from 100-120 GHz at 300 K up to 195 GHz at 50 K. These high-frequency characteristics are the first reported at low temperature on Si/SiGe n-MODFET's and are also the highest room temperature data reported so far. Physical modeling is used to explain the main trends observed when cooling down the n-MODFET. Many experimental data are presented, The dependence on temperature and biases of the important small-signal equivalent circuit parameters is investigated to analyze the device high-frequency performances and the minimum noise figure of the intrinsic device is determined.
引用
收藏
页码:1477 / 1483
页数:7
相关论文
共 28 条
[1]   STRAIN-INDUCED TWO-DIMENSIONAL ELECTRON-GAS IN SELECTIVELY DOPED SI/SIXGE1-X SUPERLATTICES [J].
ABSTREITER, G ;
BRUGGER, H ;
WOLF, T ;
JORKE, H ;
HERZOG, HJ .
PHYSICAL REVIEW LETTERS, 1985, 54 (22) :2441-2444
[2]   Enhancements and degradations in ultrashort gate GaAs and InP HEMTs properties at cryogenic temperatures: An overview [J].
Aniel, F ;
Sylvestre, A ;
Jin, Y ;
Crozat, P ;
deLustrac, A ;
Adde, R .
JOURNAL DE PHYSIQUE IV, 1996, 6 (C3) :145-149
[3]  
ANIEL F, 1997, P ESSDERC, P708
[4]   High frequency noise of MOSFETs. II. Experiments [J].
Chen, CH ;
Deen, MJ ;
Yan, ZX ;
Schroter, M ;
Enz, C .
SOLID-STATE ELECTRONICS, 1998, 42 (11) :2083-2092
[5]   PRECISE DETERMINATION OF OPEN CIRCUIT CAPACITANCE OF COPLANAR PROBES FOR ON-WAFER AUTOMATIC NETWORK ANALYZER MEASUREMENTS [J].
CROZAT, P ;
HENAUX, JC ;
VERNET, G .
ELECTRONICS LETTERS, 1991, 27 (16) :1476-1478
[6]  
DAMBKES H, 1985, IEDM, P768
[7]  
Dollfus P, 1997, PHYS STATUS SOLIDI B, V204, P541, DOI 10.1002/1521-3951(199711)204:1<541::AID-PSSB541>3.0.CO
[8]  
2-2
[9]   Si/Si1-xGex heterostructures: Electron transport and field-effect transistor operation using Monte Carlo simulation [J].
Dollfus, P .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (08) :3911-3916
[10]   Design and fabrication of Si/SiGe n-type MODFETs [J].
Gluck, M ;
Hackbarth, T ;
Birk, M ;
Haas, A ;
Kohn, E ;
Konig, U .
PHYSICA E, 1998, 2 (1-4) :763-767