X-ray characterization of bulk AlN single crystals grown by the sublimation technique

被引:49
作者
Raghothamachar, B [1 ]
Dudley, M
Rojo, JC
Morgan, K
Schowalter, LJ
机构
[1] SUNY Stony Brook, Dept Mat Sci & Engn, Stony Brook, NY 11794 USA
[2] Crystal IS Inc, Latham, NY 12110 USA
[3] Rensselaer Polytech Inst, Dept Phys Appl Phys & Astron, Troy, NY 12180 USA
关键词
X-ray topography; high-resolution X-ray diffraction; defects; growth from vapor; single crystal growth; aluminum nitride;
D O I
10.1016/S0022-0248(02)02253-4
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Bulk AlN single crystal boules have been grown using the sublimation technique and several substrates have been prepared from them. Microstructural characterization of these substrates has been performed using synchrotron white beam X-ray topography (SWBXT) and high-resolution triple axis X-ray diffraction. Our study has revealed that AlN single crystal boules grown by the sublimation technique can possess a high structural quality with dislocation densities of 800-1000/cm(2) and rocking curves with a full-width at half-maximum of less than 10 arcsec. The distribution of dislocations is inhomogeneous with large areas of the wafer free from dislocations. Inclusions are also observed (density of the order of 10(5)/cm(3)) and their distribution is also inhomogeneous. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:244 / 250
页数:7
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