Ga vacancies as dominant intrinsic acceptors in GaN grown by hydride vapor phase epitaxy

被引:120
作者
Oila, J
Kivioja, J
Ranki, V
Saarinen, K
Look, DC
Molnar, RJ
Park, SS
Lee, SK
Han, JY
机构
[1] Aalto Univ, Phys Lab, FIN-02015 Espoo, Finland
[2] Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
[3] MIT, Lincoln Lab, Lexington, MA 02420 USA
[4] Samsung Adv Inst Technol, Suwon 440600, South Korea
关键词
D O I
10.1063/1.1569414
中图分类号
O59 [应用物理学];
学科分类号
摘要
Positron annihilation measurements reveal show that negative Ga vacancies are the dominant acceptors in n-type gallium nitride grown by hydride vapor phase epitaxy. The concentration of Ga vacancies decreases, from more than 10(19) to below 10(16) cm(-3), as the distance from the interface region increases from 1 to 300 mum. These concentrations are the same as the total acceptor densities determined in Hall experiments. The depth profile of O is similar to that of V-Ga, suggesting that the Ga vacancies are complexed with the oxygen impurities. (C) 2003 American Institute of Physics.
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页码:3433 / 3435
页数:3
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