Roughness evolution of ion sputtered rotating InP surfaces: Pattern formation and scaling laws

被引：310

作者：

Frost, F ^{[1
]}

Schindler, A ^{[1
]}

Bigl, F ^{[1
]}

机构：

[1] Inst Oberflachenmodifizierung, D-04318 Leipzig, Germany

来源：

PHYSICAL REVIEW LETTERS | 2000年 / 85卷 / 19期

关键词：

D O I：

10.1103/PhysRevLett.85.4116

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The topography evolution of simultaneously rotated and Ar+ ion sputtered InP surfaces was studied using scanning force microscopy. For certain sputter conditions, the formation of a highly regular hexagonal pattern of close-packed mounds was observed with a characteristic spatial wavelength which increases with sputter time t according to lambda similar to t(gamma) with gamma similar or equal to 0.26. Based on the analysis of the dynamic scaling behavior of the surface roughness, the evolution of the surface topography will be discussed within the limits of existing models for surface erosion by ion sputtering.

引用

页码：4116 / 4119

页数：4

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