Status report: solar cell related research and development using amorphous and microcrystalline silicon deposited by HW(Cat)CVD

被引：28

作者：

Schroeder, B

机构：

[1] Univ Kaiserslautern, Dept Phys, D-67653 Kaiserslautern, Germany

[2] Univ Kaiserslautern, Ctr Mat Sci, D-67653 Kaiserslautern, Germany

来源：

THIN SOLID FILMS | 2003年 / 430卷 / 1-2期

关键词：

hot-wire CVD; amorphous silicon; microcrystalline silicon; solar cells;

D O I：

10.1016/S0040-6090(03)00070-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This article reviews the research and development of a-Si:H and muc-Si:H based solar cells by using hot wire chemical vapor deposition (HWCVD). The groups involved and the present status of conversion efficiencies attained are listed and will be discussed for different cell structures realized entirely or partly using this method. There are three main advantages of HWCVD: a quite simple set up, higher useable deposition rates and higher stability of HW-a-Si:H. It will be discussed how these advantages can be exploited to make HWCVD an alternative to plasma enhanced chemical vapor deposition. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：1 / 6

页数：6

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