Morphological and micro-Raman investigations on Ar+-ion irradiated nanostructured GaAs surface

被引:30
作者
Mohanta, S. K.
Soni, R. K.
Gosvami, N.
Tripathy, S.
Kanjilal, D.
机构
[1] Indian Inst Technol, Dept Phys, New Delhi 110016, India
[2] Inst Mat Res & Engn, Singapore 117602, Singapore
[3] Inter Univ Accelerator Ctr, New Delhi 110016, India
关键词
nanostructuring; low energy ion irradiation; GaAs; Raman scattering; rapid thermal annealing;
D O I
10.1016/j.apsusc.2006.10.020
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Low energy Ar+-ion irradiation at normal incidence is used to fabricate nanostructured GaAs surface. Atomic force microscopy (AFM) images reveal the formation of GaAs surface nanodots with an average size of about 25-35 nm. The swelling of irradiated surface is observed at a higher energy due to the ion beam-induced porosity in the amorphized GaAs surface. Micro-Raman scattering shows a gradual increase in the downward shift and line shape broadening of optical phonon modes from the nanostructured GaAs prepared with increasing ion dose and beam energy. The rapid broadening of the transverse-optical phonon mode at a higher energy and dose represents the onset of plastic deformation of the irradiated surface. Furthermore, the influence of rapid thermal annealing (RTA) shows a reverse LO and TO phonon peakshift and the change in the lineshape due to reduction of the amorphous disorder. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:4531 / 4536
页数:6
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