High-power recessed-gate AlGaN-GaNHFET with a field-modulating plate

被引:51
作者
Okamoto, Y [1 ]
Ando, Y
Nakayama, T
Hataya, K
Miyamoto, H
Inoue, T
Senda, M
Hirata, K
Kosaki, M
Shibata, N
Kuzuhara, M
机构
[1] NEC Corp Ltd, Res & Dev Assoc Future Electron Devices, Syst Devices Res Labs, Kawasaki, Kanagawa 5200833, Japan
[2] Toyoda Gosei Co Ltd, Optoelect Tech Div, Res & Dev Assoc Future Electron Devices, Aichi 4901312, Japan
关键词
field-effect transistors (FET); field-modulating plate (FP); GaN; recess;
D O I
10.1109/TED.2004.838453
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Recessed-gate AlGaN-GaN heterojunction field-effect transistors (FETs) with a field-modulating plate (FP) have been successfully fabricated for high-voltage and high-power microwave applications. The developed recessed-gate FP-FET with a gate length of 1 pm exhibited an increased transconductance of 200 mS/mm. A series of current collapse measurements revealed that the recessed-gate FP-FET is highly desirable for collapse-free high-voltage power operation. Equivalent circuit analysis demonstrated that the gain loss due to the additional gate feedback capacitance associated with the FP electrode is considerably compensated by increasing the drain bias voltage to more than 30 V. A 48-mm-wide recessed-gate FP-FET biased at a drain voltage of 48 V exhibited a record saturated output power of 197 W with a linear gain of 10.1 dB and a power-added efficiency of 67% at 2 GM.
引用
收藏
页码:2217 / 2222
页数:6
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