Effect of bias treatment in the CVD diamond growth on Ir(001)

被引：17

作者：

Kono, S

Takano, I

Goto, I

Ikejima, Y

Shiraishi, M

Abukawa, T

Yamada, T

Sawabe, A

机构：

[1] Tohoku Univ, IMRAM, Aoba Ku, Sendai, Miyagi 9808577, Japan

[2] Aoyama Gakuin Univ, Dept Elect Engn, Sagamihara, Kanagawa 2298558, Japan

来源：

关键词：

diamond growth and characterisation; CVD hetero-epitaxial diamond (001); X-ray photoelectron diffraction; Ir(001) substrate;

D O I：

10.1016/j.diamond.2004.07.009

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of bias treatment (BT) on direct-current plasma CVD diamond growth has been studied in situ by X-ray photoelectron diffraction (XPD) together with LEED and XPS. It was found that C 1s XPD patterns from the sample after BT are similar to those of diamond (001). Coverage of carbon after BT is several tens of ML when BT is very successful. However, LEED shows no diamond (001) spots for the sample after BT. These apparently contradictory findings are explained by the sizes of the diamond (001) crystallites, which, after BT, are large enough to produce C 1s XPD patterns of diamond, but too small to have coherent interference spots in LEED. It is concluded from this and other information that BT in a DC plasma creates hetero-epitaxial diamond crystallites a few nm or less. These diamond crystallites may be related to the atomically abrupt diamond/Ir interfaces of DC plasma CVD-grown samples revealed by TEM [A. Sawabe H. Fukuda, T. Suzuki, Y. Ikuhara, T. Suzuki, Surf. Sci. 467 (2000) L845]. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：2081 / 2087

页数：7

共 16 条

[1] Application of CVD-diamond for catheter ablation in the heart [J].