Measurement and control of absolute nitrogen atom density in an electron-beam-excited plasma using vacuum ultraviolet absorption spectroscopy

被引:54
作者
Tada, S
Takashima, S
Ito, M
Hori, M
Goto, T
Sakamoto, Y
机构
[1] Nagoya Univ, Dept Quantum Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
[2] Nichimen Elect Technol Corp, Kagawa, Saitama 3501155, Japan
关键词
D O I
10.1063/1.1305559
中图分类号
O59 [应用物理学];
学科分类号
摘要
The absolute nitrogen (N) atom density in an electron-beam-excited plasma (EBEP) operating at an ultralow pressure has been investigated by vacuum ultraviolet absorption spectroscopy, employing a microdischarge hollow-cathode lamp. The measured N atom density was estimated to be around 6x10(11) cm(-3), and the dissociation fraction was 4.9% at a N-2 pressure of 0.05 Pa, an electron-beam current of 10 A, and an electron-beam acceleration voltage of 120 V. The EBEP potentially enables us to control the electron density and electron energy independently with the electron-beam current and electron-beam acceleration voltages, respectively. It was found that N atom densities increased with increasing electron-beam current and electron acceleration voltage under low-pressure conditions. The EBEP shows great promise as a N atom source operating at an ultralow pressure. (C) 2000 American Institute of Physics. [S0021-8979(00)01616-9].
引用
收藏
页码:1756 / 1759
页数:4
相关论文
共 13 条
[1]   SILICON-NITRIDE FILMS DEPOSITED WITH AN ELECTRON-BEAM CREATED PLASMA [J].
BISHOP, DC ;
EMERY, KA ;
ROCCA, JJ ;
THOMPSON, LR ;
ZARNANI, H ;
COLLINS, GJ .
APPLIED PHYSICS LETTERS, 1984, 44 (06) :598-600
[2]   EPITAXIAL-GROWTH OF GAN ON SAPPHIRE(0001) SUBSTRATES BY ELECTRON-CYCLOTRON-RESONANCE MOLECULAR-BEAM EPITAXY [J].
CHO, SH ;
SAKAMOTO, H ;
AKIMOTO, K ;
OKADA, Y ;
KAWABE, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1995, 34 (2B) :L236-L239
[3]   ELECTRON-IMPACT DISSOCIATION OF NITROGEN [J].
COSBY, PC .
JOURNAL OF CHEMICAL PHYSICS, 1993, 98 (12) :9544-9553
[4]   NEW HIGH-CURRENT LOW-ENERGY ION-SOURCE [J].
HARA, T ;
HAMAGAKI, M ;
SANDA, A ;
AOYAGI, Y ;
NAMBA, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :366-368
[5]   A high efficiency nitrogen atom source for accelerator target studies [J].
Higgins, DP ;
McCullough, RW ;
Geddes, J ;
Schlapp, M ;
Woolsey, J ;
Salzborn, E ;
Gilbody, HB .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1995, 103 (04) :508-510
[6]   CROSS-SECTIONS FOR COLLISIONS OF ELECTRONS AND PHOTONS WITH NITROGEN MOLECULES [J].
ITIKAWA, Y ;
HAYASHI, M ;
ICHIMURA, A ;
ONDA, K ;
SAKIMOTO, K ;
TAKAYANAGI, K ;
NAKAMURA, M ;
NISHIMURA, H ;
TAKAYANAGI, T .
JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1986, 15 (03) :985-1010
[7]  
Mitchell A. G., 1971, RESONANCE RAD EXCITE
[8]   ELECTRON-TRANSPORT MECHANISM IN GALLIUM NITRIDE [J].
MOLNAR, RJ ;
LEI, T ;
MOUSTAKAS, TD .
APPLIED PHYSICS LETTERS, 1993, 62 (01) :72-74
[9]   TOTAL CROSS SECTIONS FOR IONIZATION AND ATTACHMENT IN GASES BY ELECTRON IMPACT .I. POSITIVE IONIZATION [J].
RAPP, D ;
ENGLANDE.P .
JOURNAL OF CHEMICAL PHYSICS, 1965, 43 (05) :1464-&
[10]   Vacuum ultraviolet absorption spectroscopy employing a microdiacharge hollow-cathode lamp for absolute density measurements of hydrogen atoms in reactive plasmas [J].
Takashima, S ;
Hori, M ;
Goto, T ;
Kono, A ;
Ito, M ;
Yoneda, K .
APPLIED PHYSICS LETTERS, 1999, 75 (25) :3929-3931