Charge pumping analysis of radiation effects in LOCOS parasitic transistors

被引:24
作者
Flament, O
Autran, JL
Paillet, P
Roche, P
Faynot, O
Truche, R
机构
[1] Inst Natl Sci Appl, LPM, UMR CNRS 5511, F-69621 Villeurbanne, France
[2] Ctr Etud Bruyeres Le Chatel, CEA, F-91680 Bruyeres Le Chatel, France
[3] Univ Montpellier 2, CEM, F-34095 Montpellier 05, France
关键词
D O I
10.1109/23.658964
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have performed current-voltage and charge pumping measurements on LOGOS parasitic transistors submitted to x-ray irradiation. The electrical behavior and the charge pumping response of these non-planar structures have been analyzed by two-dimensional computer simulations. We report how this experimental approach allows us to obtain quantitative information about oxide charge and interface trap densities in different parts of the complete structure. Our results show a maximum of oxide charge trapping and interface trap buildup in the bird's beak regions after irradiation. The generation of radiation-induced interface and border traps along the LOGOS SiO2/Si interface is discussed, in terms of trap density and frequency response.
引用
收藏
页码:1930 / 1938
页数:9
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