EVOLUTION OF CAPTURE CROSS-SECTION OF RADIATION-INDUCED INTERFACE TRAPS IN MOSFETS AS STUDIED BY A RAPID CHARGE PUMPING TECHNIQUE

被引:6
作者
CHEN, WL [1 ]
BALASINSKI, A [1 ]
MA, TP [1 ]
机构
[1] YALE UNIV,DEPT ELECT ENGN,NEW HAVEN,CT 06520
关键词
D O I
10.1109/23.211416
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Using a rapid charge pumping technique, we found that the mean capture cross-section of interface traps in MOSFETs sharply decreased immediately after irradiation. Further changes of the capture cross-section during subsequent relaxation depended on the gate bias during both irradiation and storage. Radiation dose dependence has also been investigated. Possible mechanisms and correlations between interface-trap density and capture cross-section are discussed.
引用
收藏
页码:2152 / 2157
页数:6
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