Current transport in short channel top-contact pentacene field-effect transistors investigated with the selective molecular doping technique

被引:66
作者
Fujimori, F. [1 ]
Shigeto, K.
Hamano, T.
Minari, T.
Miyadera, T.
Tsukagoshi, K.
Aoyagi, Y.
机构
[1] RIKEN, Wako, Saitama 3510198, Japan
[2] JST, CREST, Kawaguchi, Saitama 3320012, Japan
[3] Tokyo TECH, Kanagawa 2268502, Japan
关键词
D O I
10.1063/1.2737418
中图分类号
O59 [应用物理学];
学科分类号
摘要
The contact doping profile is controlled in the top-contact configuration to clarify a transistor operation based on a current injection process from the metal contact to the organic channel in a submicron channel pentacene field-effect transistor. The molecular doping in the pentacene film underneath the metal contact, in which a thin layer of iron (III) chloride was introduced, drastically changes transistor characteristics. The doping profile control directly revealed the resistive part for current injection. A model to explain the saturation behavior of the top-contact short channel organic transistor is presented. (C) 2007 American Institute of Physics.
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页数:3
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