Nano-scale effects of swift heavy ion irradiation in SiOx layers and multilayers

被引：14

作者：

Arnoldbik, W. M.

Knoesen, D.

Tomozeiu, N.

Habraken, F. H. P. M.

机构：

[1] Univ Utrecht, Dept Phys & Astron, Debye Inst, NL-3508 TA Utrecht, Netherlands

[2] Univ Western Cape, Dept Phys, ZA-7535 Bellville, South Africa

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2007年 / 258卷 / 01期

关键词：

silicon dioxide; amorphous silicon; phase separation; multilayers; nanostructures; MeV ion beam irradiation;

D O I：

10.1016/j.nimb.2006.12.103

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Irradiation of SiOx layers and multilayers (0 <= x <= 2) with swift heavy ions gives rise to a rich variety of phenomena. These phenomena imply displacement of atoms inside the layer structure, removal of species from the material by electronic sputtering or molecule formation, the extent of which depends strongly on the x-value and irradiation parameters. Other phenomena are phase separation inside the material and modifications on the nano-scale at Si/SiOx interfaces. The paper briefly reviews these phenomena and presents new data concerning nand-scale modifications in the multilayers. (c) 2006 Elsevier B.V. All rights reserved.

引用

收藏

页码：199 / 204

页数：6

相关论文

共 20 条

[1] Swift heavy ion induced modifications of silicon (sub) oxide nitride layer structures [J].

Arnoldbik, W. M. ;

Habraken, F. H. P. M. .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2007, 256 (01) :300-304

[2] High-energy ion-beam-induced phase separation in SiOx films -: art. no. 125329 [J].

Arnoldbik, WM ;

Tomozeiu, N ;

van Hattum, ED ;

Lof, RW ;

Vredenberg, AM ;

Habraken, FHPM .

PHYSICAL REVIEW B, 2005, 71 (12)

[3] Electronic sputtering of silicon suboxide films by swift heavy ions [J].

Arnoldbik, WM ;

van Emmichoven, PAZ ;

Habraken, FHPM .

PHYSICAL REVIEW LETTERS, 2005, 94 (24)

[4] Desorption of O2 from SiO2 films during irradiation of SiO2 with MeV/a.m.u. heavy ions [J].

Arnoldbik, WM ;

Tomozeiu, N ;

Habraken, FHPM .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 219 :312-316

[5] Ion beam induced desorption from thin films:: SiO2 single layers andSiO2/Si multilayers [J].

Arnoldbik, WM ;

Tomozeiu, N ;

Habraken, FHPM .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 190 :433-438

[6] Self-organised nano-structuring of thin oxide-films under swift heavy ion bombardment [J].

Bolse, W .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2006, 244 (01) :8-14

[7] Modification of thin-layer systems by swift heavy ions [J].

Bolse, W ;

Schattat, B ;

Feyh, A .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2003, 77 (01) :11-15

[8] Interface modification by swift heavy ions [J].

Bolse, W .

RADIATION MEASUREMENTS, 2003, 36 (1-6) :597-603

[9] Coulomb explosion and thermal spikes [J].

Bringa, EM ;

Johnson, RE .

PHYSICAL REVIEW LETTERS, 2002, 88 (16) :4-165501

[10] Ion tracks in quartz and vitreous silica [J].

Klaumünzer, S .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 225 (1-2) :136-153