Strain rate effects on the mechanical behavior of nanocrystalline Au films

被引:68
作者
Chasiotis, I.
Bateson, C.
Timpano, K.
McCarty, A. S.
Barker, N. S.
Stanec, J. R.
机构
[1] Univ Illinois, Urbana, IL 61801 USA
[2] Univ Virginia, Charlottesville, VA 22904 USA
基金
美国国家科学基金会;
关键词
gold films; strain rated; dislocation creep; RF-MEMS;
D O I
10.1016/j.tsf.2006.01.033
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effect of fabrication, film thickness, and strain rate oil the mechanical behavior of Au films with 100 nm (evaporated gold) and 200 nm (electroplated gold) average grain sizes was investigated. Uniaxial tension was imposed at 10(-3) 10(-6) s(-1) strain rates on evaporated 0.5 mu m and 0.65 mu m thick An specimens, and at 10(-2)-10(-5) s(-1) oil electroplated 2.8 mu m thick An specimens. Strain rates between 10(-3) and 10(-5) s(-1) had a marked impact on the ultimate strain of evaporated films and less significant effect on their yield and saturation stress. The ductility increased with decreasing strain rate and it varied between 2-4.5% for 500-650 nm thick films and 3.4-10.6% for 2.8 mu m thick films. When compared at the same strain rate, the thick electroplated films were more ductile than the thin evaporated films, but their yield and saturation stresses were lower, possibly due to their larger grain size. Qualitatively, the stress-strain behavior was consistent at all rates except at the slowest that resulted in significantly different trends. A marked decrease of the maximum strength, effective Young's modulus, and yield strength Occurred at 10(-6) s(-1) to,thin, and at 10(-5) s(-1) for thick films, while for 500 nm thin films multiple stress localizations per stress-strain curve were recorded. Because of temperature, applied stress, and grain size considerations this behavior was attributed to dislocation creep taking place at a strain rate comparable to the applied strain rate. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:3183 / 3189
页数:7
相关论文
共 33 条
[1]   Overview no. 130 - Size effects in materials due to microstructural and dimensional constraints: A comparative review [J].
Arzt, E .
ACTA MATERIALIA, 1998, 46 (16) :5611-5626
[2]  
BAKER SP, 2002, MRS BULL, P26
[3]   Tensile testing of ultrathin polycrystalline films:: A synchrotron-based technique [J].
Böhm, J ;
Gruber, P ;
Spolenak, R ;
Stierle, A ;
Wanner, A ;
Arzt, E .
REVIEW OF SCIENTIFIC INSTRUMENTS, 2004, 75 (04) :1110-1119
[4]  
CAI B, 1999, SCRIPTA MATER, V47, P755
[5]   Mechanics of thin films and microdevices [J].
Chasiotis, I .
IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY, 2004, 4 (02) :176-188
[6]   A new microtensile tester for the study of MEMS materials with the aid of atomic force microscopy [J].
Ioannis Chasiotis ;
Wolfgang G. Knauss .
Experimental Mechanics, 2002, 42 (1) :51-57
[7]  
CHASIOTIS I, 2000, P MICR SYST MECH MEA, P56
[8]   Young's modulus, Poisson's ratio and failure properties of tetrahedral amorphous diamond-like carbon for MEMS devices [J].
Cho, S ;
Chasiotis, I ;
Friedmann, TA ;
Sullivan, JP .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2005, 15 (04) :728-735
[9]  
El-Deiry PA, 2002, MATER RES SOC SYMP P, V695, P159
[10]   Tensile behavior of free-standing gold films. Part II. Fine-grained films [J].
Emery, RD ;
Povirk, GL .
ACTA MATERIALIA, 2003, 51 (07) :2079-2087