Native oxidation of sputter deposited polycrystalline copper thin films during short and long exposure times: Comparative investigation by specular and non-specular grazing incidence X-ray absorption spectroscopy

被引:27
作者
Keil, P. [2 ]
Frahm, R. [1 ]
Luetzenkirchen-Hecht, D. [1 ]
机构
[1] Berg Univ Wuppertal, Fachbereich C, Inst Expt Phys, D-42097 Wuppertal, Germany
[2] Max Planck Inst Eisenforsch GmbH, Dept Interface Chem & Surface Engn, D-40237 Dusseldorf, Germany
关键词
Copper; Sputtered films; AFS (EXAFS & XANES); Atmospheric corrosion; Oxidation; Passive films; ANOMALOUS FINE-STRUCTURE; REFLECTION-MODE EXAFS; IN-SITU STM; INITIAL-STAGES; OXIDE-FILMS; SURFACE; SCATTERING; INTERFACE; CORROSION; BEHAVIOR;
D O I
10.1016/j.corsci.2009.12.012
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin copper-oxide layers formed on Cu-metal due to the exposure to ambient air at short and long time-scales were investigated by means of reflection mode grazing incidence X-ray absorption spectroscopy under specular and non-specular conditions. The quantitative evaluation of near edge X-ray absorption, as well as specular and non-specular EXAFS data measured for various different grazing angles show that the oxide film is best described by a model structure consisting of a duplex type oxide layer with an outer layer of CuO in contact with the gas atmosphere and an inner Cu2O layer at the interface to the underlying Cu-metal. (C) 2009 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1305 / 1316
页数:12
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