Improvement of the luminous intensity of light-emitting diodes by using highly transparent Ag-indium tin oxide p-type ohmic contacts

被引:56
作者
Song, JO [1 ]
Leem, DS
Kwak, JS
Park, Y
Chae, SW
Seong, TY
机构
[1] Gwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea
[2] Samsung Adv Inst Technol, Photon Lab, Suwon 440600, South Korea
[3] Samsung Elect Mech Co Ltd, Discrete Semiconductor Div, Suwon 443743, South Korea
关键词
Ag; GaN; indium tin oxide (ITO); light-emitting diode (LED); ohmic contact;
D O I
10.1109/LPT.2004.839783
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have investigated Ag-indium tin oxide (ITO) scheme for obtaining high-quality p-type ohmic contacts for GaN-based light-emitting diodes (LEDs). The Ag(1 nm)-ITO(200 nm) contacts exhibit greatly improved electrical characteristics when annealed at temperatures in the range 400 degreesC-600 degreesC for 1 min in air, yielding specific contact resistances of similar to10(-4) Omega(.)cm(2). In addition, the contacts give transmittance of about 96% at 460 nm, which is far better than that of the conventionally used oxidized Ni-Au contacts. It is shown that the luminous intensity of blue LEDs fabricated with the Ag-ITO contacts is about three times higher than that of LEDs with oxidized Ni-Au contacts. This result strongly indicates that the Ag-ITO scheme can serve as a highly promising p-type ohmic contact for the realization of high brightness near ultraviolet LEDs.
引用
收藏
页码:291 / 293
页数:3
相关论文
共 14 条
[1]  
[Anonymous], METAL SEMICONDUCTOR
[2]   Low-resistance ohmic contacts to p-type GaN [J].
Ho, JK ;
Jong, CS ;
Chiu, CC ;
Huang, CN ;
Chen, CY ;
Shih, KK .
APPLIED PHYSICS LETTERS, 1999, 74 (09) :1275-1277
[3]   Low-resistance and high-transparency Ni/indium tin oxide ohmic contacts to p-type GaN [J].
Horng, RH ;
Wuu, DS ;
Lien, YC ;
Lan, WH .
APPLIED PHYSICS LETTERS, 2001, 79 (18) :2925-2927
[4]   Effect of an indium-tin-oxide overlayer on transparent Ni/Au ohmic contact on p-type GaN [J].
Kim, SY ;
Jang, HW ;
Lee, JL .
APPLIED PHYSICS LETTERS, 2003, 82 (01) :61-63
[5]   Reduction of the Schottky barrier height on silicon carbide using Au nano-particles [J].
Lee, SK ;
Zetterling, CM ;
Östling, M ;
Åberg, I ;
Magnusson, MH ;
Deppert, K ;
Wernersson, LE ;
Samuelson, L ;
Litwin, A .
SOLID-STATE ELECTRONICS, 2002, 46 (09) :1433-1440
[6]   Nitride-based light-emitting diodes with Ni/ITO p-type ohmic contacts [J].
Lin, YC ;
Chang, SJ ;
Su, YK ;
Tsai, TY ;
Chang, CS ;
Shei, SC ;
Hsu, SJ ;
Liu, CH ;
Liaw, UH ;
Chen, SC ;
Huang, BR .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2002, 14 (12) :1668-1670
[7]   Indium tin oxide contacts to gallium nitride optoelectronic devices [J].
Margalith, T ;
Buchinsky, O ;
Cohen, DA ;
Abare, AC ;
Hansen, M ;
DenBaars, SP ;
Coldren, LA .
APPLIED PHYSICS LETTERS, 1999, 74 (26) :3930-3932
[8]   THE EFFECTS OF CONTACT SIZE AND NON-ZERO METAL RESISTANCE ON THE DETERMINATION OF SPECIFIC CONTACT RESISTANCE [J].
MARLOW, GS ;
DAS, MB .
SOLID-STATE ELECTRONICS, 1982, 25 (02) :91-94
[9]   Enhanced output power of InGaN-GaN light-emitting diodes with high-transparency nickel-oxide-indium-tin-oxide ohmic contacts [J].
Pan, SM ;
Tu, RC ;
Fan, YM ;
Yeh, RC ;
Hsu, JT .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2003, 15 (05) :646-648
[10]   High-transparency Ni/Au ohmic contact to p-type GaN [J].
Sheu, JK ;
Su, YK ;
Chi, GC ;
Koh, PL ;
Jou, MJ ;
Chang, CM ;
Liu, CC ;
Hung, WC .
APPLIED PHYSICS LETTERS, 1999, 74 (16) :2340-2342