Three-dimensional simulation of film microstructure produced by glancing angle deposition

被引:68
作者
Smy, T [1 ]
Vick, D
Brett, MJ
Dew, SK
Wu, AT
Sit, JC
Harris, KD
机构
[1] Carleton Univ, Dept Elect, Ottawa, ON K1S 5B6, Canada
[2] Univ Alberta, Dept Elect & Comp Engn, Edmonton, AB T6G 2G7, Canada
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2000年 / 18卷 / 05期
关键词
D O I
10.1116/1.1286394
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A novel three-dimensional (3D) ballistic deposition simulator 3D-FILMS has been developed for the modeling of thin film deposition and structure. The simulator features a ballistic transport algorithm to model incident species with angular distributions appropriate to physical vapor deposition systems. Two-tiered data structuring is employed in order to enable the simulator to run using memory resources available to workstations. The simulator has been applied to a unique class of thin films grown by the technique of glancing angle deposition (GLAD). These films exhibit low bulk density due to an internal structure consisting of isolated microcolumns, which can be engineered into a variety of 3D forms. Because of their inherent 3D morphology, created by a combination of complex substrate motion and 3D shadowing, GLAD films represent an ideal test subject for 3D simulation. Scanning electron microscope images of films are presented together with simulation results, which correctly reproduce aspects of column morphology, column growth competition and extinction, and film bulk density. (C) 2000 American Vacuum Society. [S0734-2101(00)03805-7].
引用
收藏
页码:2507 / 2512
页数:6
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