Absence of carrier recombination associated with the defect pool model in intrinsic amorphous silicon layers:: Evidence from current-voltage characteristics on p-i-n and n-i-p solar cells

被引:24
作者
Deng, J [1 ]
Pearce, JM [1 ]
Koval, RJ [1 ]
Vlahos, V [1 ]
Collins, RW [1 ]
Wronski, CR [1 ]
机构
[1] Penn State Univ, Ctr Thin Film Devices, University Pk, PA 16802 USA
关键词
D O I
10.1063/1.1571985
中图分类号
O59 [应用物理学];
学科分类号
摘要
Forward bias current-voltage characteristics (J(D)-V) were studied for both p-i-n (superstrate) and n-i-p (substrate) (a-SiC:H p)/(a-Si:H i) solar-cell structures having different p/i interface layers and different thickness i-layers. Contributions of the p/i interfaces to the J(D)-V characteristics were separated, and the dependence on the thickness of the i-layers was established. Equivalence was observed in a comparison of the characteristics of p-i-n and n-i-p cells. The various J(D)-V characteristics are found to be consistent with uniform densities of defects in the i-layers, and thus inconsistent with the spatially varying large densities of defects predicted for solar-cell structures by the defect pool model. (C) 2003 American Institute of Physics.
引用
收藏
页码:3023 / 3025
页数:3
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