Plasma polymer films rf sputtered from PTFE under various argon pressures

被引：71

作者：

Stelmashuk, V

Biederman, H

Slavínská, D

Zemek, J

Trchová, M

机构：

[1] Charles Univ Prague, Fac Math & Phys, CR-18000 Prague, Czech Republic

[2] Acad Sci Czech Republ, Inst Plasma Phys, Prague 18221 8, Czech Republic

[3] Acad Sci Czech Republ, Inst Phys, CZ-16253 Prague 6, Czech Republic

[4] Acad Sci Czech Republ, Inst Macromol Chem, CR-16206 Prague 6, Czech Republic

来源：

VACUUM | 2005年 / 77卷 / 02期

关键词：

RF sputtering; PTFE; fluorocarbon plasma polymers; thin film;

D O I：

10.1016/j.vacuum.2004.08.011

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Fluorocarbon plasma polymer films were prepared by radio-frequency (rf) sputtering of polytetrafluoroethylene (PTFE). Their wettability decreased with the increase in pressure of argon working gas. The films deposited at 70 Pa were found to be superhydrophobic plasma polymers with a static contact angle 146degrees for water. Sputtered fluorocarbon plasma polymer films were characterized by atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and infrared (IR) spectroscopy. The paper shows that the surface composition and chemical structure of the films vary with altering the argon gas pressure. (C) 2004 Published by Elsevier Ltd.

引用

页码：131 / 137

页数：7

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