Organic films prepared by polymer sputtering

Deposition of organic films by means of radio frequency (rf) sputtering of conventional polymers became the center of attention in the 1970s. The interest was particularly in polytetrafluoroethylene (PTFE) and recently it has been renewed. In addition to PTFE, polyimide and polyethylene (PE) sputtering has also been studied. Findings from these studies are briefly reviewed. Our results of the kinetics of rf magnetron sputtering of PTFE by energy resolved mass spectrometry are shown in more detail. Various CXFY species were detected in the discharge, with the composition affected by the discharge parameters. It is assumed that CF, CF2, and CF3 fragments from the sputter process are the most important for film growth. The morphology of fluorocarbon plasma polymer films deposited on Si substrates at various temperatures was observed by means of scanning electron microscopy. It was concluded that below +23 degrees C, a columnar structure appears. The structure and basic properties of hydrocarbon plasma polymer films prepared by rf sputtering of PE are concisely presented. Composite metal/plasma polymer films prepared by polymer and metal cosputtering are briefly discussed. (C) 2000 American Vacuum Society. [S0734-2101(00)03504-1].