Passivation of InP surfaces of electronic devices by organothiolated self-asse.mbled monolayers

被引:29
作者
Schvartzman, M
Sidorov, V
Ritter, D
Paz, Y [1 ]
机构
[1] Technion Israel Inst Technol, Dept Chem Engn, IL-32000 Haifa, Israel
[2] Technion Israel Inst Technol, Dept Elect Engn, IL-32000 Haifa, Israel
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 01期
关键词
D O I
10.1116/1.1532026
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Surface passivation with organothiolated self-assembled monolayers (SAMs) that form chemical bonds with the InP surface is described. Indium phosphide surfaces coated with thiolated SAMs were characterized by Fourier-transform infrared spectroscopy, contact angle measurements, and Auger spectroscopy. The steady state photoluminescence of InP wafers increased by a factor of 14 as a result of this surface passivation method. A decrease by one to two orders of magnitude in the dark currents of interdigitated metal-semiconductor-metal diodes and p-i-n photodiodes Was obtained. The option of using SAMs that are well-wetted by standard encapsulators such as polyimides and the thermal stability of the SAMs at the polymer's curing temperatures open the way to achieve high quality passivation and encapsulation, even when the electronic devices contain negative slope sidewalls or undercut cavities. (C) 2003 American Vacuum Society.
引用
收藏
页码:148 / 155
页数:8
相关论文
共 34 条
[1]   RECOMBINATION AT SEMICONDUCTOR SURFACES AND INTERFACES [J].
ASPNES, DE .
SURFACE SCIENCE, 1983, 132 (1-3) :406-421
[2]  
Bechstedt F, 1988, SEMICONDUCTOR SURFAC, V5
[3]   Chalcogenide passivation of III-V semiconductor surfaces [J].
Bessolov, VN ;
Lebedev, MV .
SEMICONDUCTORS, 1998, 32 (11) :1141-1156
[4]   Sulphide passivation of GaAs: the role of the sulphur chemical activity [J].
Bessolov, VN ;
Lebedev, MV ;
Binh, NM ;
Friedrich, M ;
Zahn, DRT .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1998, 13 (06) :611-614
[5]   THERMAL-STABILITY OF SELF-ASSEMBLED MONOLAYERS [J].
DELAMARCHE, E ;
MICHEL, B ;
KANG, H ;
GERBER, C .
LANGMUIR, 1994, 10 (11) :4103-4108
[6]   LOW DARK-CURRENT, HIGH-GAIN GAINAS-INP AVALANCHE PHOTODETECTORS [J].
DIADIUK, V ;
GROVES, SH ;
HURWITZ, CE ;
ISELER, GW .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1981, 17 (02) :260-264
[7]   Passivation of InP-based HBTs [J].
Driad, R ;
Laframboise, SR ;
Lu, ZH ;
McAlister, SP ;
McKinnon, WR .
SOLID-STATE ELECTRONICS, 1999, 43 (08) :1445-1450
[8]   Passivation of InGaAs surfaces and InGaAs/InP heterojunction bipolar transistors by sulfur treatment [J].
Driad, R ;
Lu, ZH ;
Charbonneau, S ;
McKinnon, WR ;
Laframboise, S ;
Poole, PJ ;
McAlister, SP .
APPLIED PHYSICS LETTERS, 1998, 73 (05) :665-667
[9]   DO WE NEED A NEW METHODOLOGY FOR GAAS PASSIVATION [J].
GREEN, AM ;
SPICER, WE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (04) :1061-1069
[10]   Electron tunneling at the semiconductor-insulator-electrolyte interface.: Photocurrent studies of the n-InP-alkanethiol-ferrocyanide system [J].
Gu, Y ;
Waldeck, DH .
JOURNAL OF PHYSICAL CHEMISTRY B, 1998, 102 (45) :9015-9028