Synthesis and characterization of halogenated amorphous silicon via a novel glow discharge process

Amorphous silicon powder has been produced in a tubular glow discharge reactor. Reaction were done using SiCl4 discharges of a mixture of hydrogen and helium at atmospheric pressure. Chemical and physical characterization of the product shows that about 1% Cl is present, the powders are predominantly amorphous, semiconducting behavior is observed, and surface oxidation occurs due to exposure to moist air. The bandgap of the material before prolonged air exposure measured by diffuse reflectance ultraviolet-visible spectroscopy methods is between 2.4 and 2.6 eV.