Synthesis and characterization of halogenated amorphous silicon via a novel glow discharge process

被引：8

作者：

Giraldo, OH

Willis, WS

Marquez, M

Suib, SL

Hayashi, Y

Matsumoto, H

机构：

[1] Univ Connecticut, Dept Chem, Storrs, CT 06269 USA

[2] Univ Connecticut, Dept Chem Engn, Storrs, CT 06269 USA

来源：

CHEMISTRY OF MATERIALS | 1998年 / 10卷 / 01期

关键词：

D O I：

10.1021/cm970536s

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Amorphous silicon powder has been produced in a tubular glow discharge reactor. Reaction were done using SiCl4 discharges of a mixture of hydrogen and helium at atmospheric pressure. Chemical and physical characterization of the product shows that about 1% Cl is present, the powders are predominantly amorphous, semiconducting behavior is observed, and surface oxidation occurs due to exposure to moist air. The bandgap of the material before prolonged air exposure measured by diffuse reflectance ultraviolet-visible spectroscopy methods is between 2.4 and 2.6 eV.

引用

页码：366 / 371

页数：6

共 38 条

[11] Plasma deposition of amorphous silicon alloys from fluorinated gases [J].