Real-time analysis of volatiles formed during processing of a chemically amplified resist

被引:9
作者
Houle, FA [1 ]
Poliskie, GM [1 ]
Hinsberg, WD [1 ]
Pearson, D [1 ]
Sanchez, MI [1 ]
Ito, H [1 ]
Hoffnagle, J [1 ]
机构
[1] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
来源
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2 | 2000年 / 3999卷
关键词
post-exposure bake; deprotection reaction; volatile products; mass spectrometry; p-(t-butyloxycarbonyloxy)styrene; p-hydroxystyrene;
D O I
10.1117/12.388301
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The analysis of vapors desorbing from resist films during processing provides important information on impurity content, loss of resist components, and available decomposition pathways that complements data obtained by film composition studies. We have constructed an instrument for in-situ sampling and identification of volatiles from both bulk polymers and cast films by tandem mass spectrometry. We have used this instrument to identify volatile products from thermal and acid catalyzed deprotection of p-(t-butyloxycarbonyloxy)styrene (PTBOCST) to form p-hydroxystyrene (PHOST). The results show that the two reaction pathways have markedly different chemistry, and that the generally accepted deprotection mechanism oversimplifies what is actually happening in the film.
引用
收藏
页码:181 / 187
页数:3
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