Pressure effects during pulsed-laser deposition of barium titanate thin films

被引:55
作者
Gonzalo, J
San Roman, RG
Perriere, J
Afonso, CN
Casero, RP
机构
[1] CSIC, Inst Opt, E-28006 Madrid, Spain
[2] Univ Autonoma Madrid, Dept Fis Aplicada 100 12, Cantoblanco 28049, Madrid, Spain
[3] Univ Paris 07, Phys Solides Grp, F-75251 Paris 05, France
[4] Univ Paris 06, URA 17 CNRS, F-75251 Paris 05, France
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1998年 / 66卷 / 05期
关键词
D O I
10.1007/s003390050701
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The composition and homogeneity of barium titanate films grown by pulsed-laser deposition at different substrate temperatures (room temperature, 700 degrees C) and gas environments (O-2, Ar) in a broad pressure range (10(-7)-1 mbar) are correlated to the plasma expansion dynamics. It is found that the deposited films present an excess of Ba in the intermediate pressure range (10(-2) < P < 10(-1) mbar) and a peaked distribution of Ba to Ti atoms ratio, that is not related to either the substrate temperature or the nature of the gas environment. The results are discussed in terms of the dependence of the plume length (L-P) On the gas pressure and the existence of scattering processes for distances (d) from the target lower than L-P and the diffusion of the ejected species for L-P < d.
引用
收藏
页码:487 / 491
页数:5
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