Electron beam radiation effects on electrical and optical properties of pure and aluminum doped tin oxide films

被引：27

作者：

Bhat, J. S. ^{[1
]}

Maddani, K. I.

Karguppikar, A. M.

Ganesh, S.

机构：

[1] Karnatak Univ, Dept Phys, Dharwad 580003, Karnataka, India

[2] Mangalore Univ, Microtron Ctr, Mangalore 574299, Karnataka, India

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2007年 / 258卷 / 02期

关键词：

sol-gel; spin coating; aluminum doped SnO2; electrical and optical properties; electron beam radiation;

D O I：

10.1016/j.nimb.2007.02.074

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The effects of electron beam radiation on electrical and optical properties of undoped (SnO2) and aluminum doped tin oxide (SnO2:Al) films are investigated. Single and multi-layered films were grown using hydro-alcoholic solution and spin coating technique under optimum deposition conditions. Exposure to electron beam radiation causes increase in the sheet resistance of both SnO2 and SnO2:Al films. A blue shift in the absorption edge in the case of SnO2 films and red shift in the case of aluminium doped Sn02 films were observed after e-beam irradiation. The extent of deviation in the electrical properties varies with doping concentrations. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：369 / 374

页数：6

共 18 条

[1] Preparation and properties of transparent conductive aluminum-doped zinc oxide thin films by sol-gel process [J].

Alam, MJ ;

Cameron, DC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (04) :1642-1646

[2] Electrical and optical property enhancement in multilayered sol-gel-deposited SnO2 films [J].

Chatelon, JP ;

Terrier, C ;

Roger, JA .

SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1999, 14 (07) :642-647

[3] Radiation damage in the TEM and SEM [J].

Egerton, RF ;

Li, P ;

Malac, M .

MICRON, 2004, 35 (06) :399-409

[4]

HUMPHREYS CJ, 1990, SCANNING MICROSCOPY, P185

[5] OPTICAL-PROPERTIES OF SPUTTER-DEPOSITED ZNO-AL THIN-FILMS [J].

JIN, ZC ;

HAMBERG, I ;

GRANQVIST, CG .

JOURNAL OF APPLIED PHYSICS, 1988, 64 (10) :5117-5131

[6] P-type electrical conduction in transparent thin films of CuAlO2 [J].

Kawazoe, H ;

Yasukawa, M ;

Hyodo, H ;

Kurita, M ;

Yanagi, H ;

Hosono, H .

NATURE, 1997, 389 (6654) :939-942

[7] ON THE USE OF ZINC ACETATE AS A NOVEL PRECURSOR FOR THE DEPOSITION OF ZNO BY LOW-PRESSURE METAL-ORGANIC CHEMICAL VAPOR-DEPOSITION [J].

KHAN, OFZ ;

OBRIEN, P .

THIN SOLID FILMS, 1989, 173 (01) :95-97

[8] ELECTRON-BEAM-INDUCED REACTIONS AT TRANSITION-METAL OXIDE SURFACES [J].

MCCARTNEY, MR ;

CROZIER, PA ;

WEISS, JK ;

SMITH, DJ .

VACUUM, 1991, 42 (04) :301-308

[9]

Mohagheghi M. M., 2003, SEMICOND SCI TECH, V18, P97

[10]

MOHAGHEGHI MMB, 2001, J APPL PHYS D, V31, P1218

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