Direct fabrication of micro mesas by VUV laser ablation of polymers: PMMA (polymethylmethacrylate)

被引：40

作者：

Lapczyna, M ^{[1
]}

Stuke, M ^{[1
]}

机构：

[1] Max Planck Inst Biophys Chem, D-37018 Gottingen, Germany

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1998年 / 66卷 / 04期

关键词：

D O I：

10.1007/s003390050698

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Mesa-like microstructures in PMMA are ablated by VUV laser irradiation at 157 nm using a water-based masking fluid as a contact mask. Smooth structures without diffraction patterns can be generated. Air bubbles, injected into the mask by means of a capillary, offer the possibility of creating circular microchambers. The surface roughness of the ablated areas is below 100 nm. The method does not require complex optical systems and is suitable for the prototyping of unique design patterns.

引用

页码：473 / 475

页数：3

共 16 条

[1] TEST OF EFFECT OF EDGE PARAMETERS ON SMALL-ANGLE FRESNEL DIFFRACTION OF LIGHT AT A STRAIGHT EDGE [J].

BARNETT, JD ;

HARRIS, FS .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1962, 52 (06) :637-&

[2]

BASTING D, 1991, P SOC PHOTO-OPT INS, V1412, P80, DOI 10.1117/12.43655

[3]

Bauerle D., 2011, LASER PROCESSING CHE, V4

[4] CONTACT LITHOGRAPHY AT 157 NM WITH AN F2 EXCIMER LASER [J].

CRAIGHEAD, HG ;

WHITE, JC ;

HOWARD, RE ;

JACKEL, LD ;

BEHRINGER, RE ;

SWEENEY, JE ;

EPWORTH, RW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1186-1189

[5] Optimization of a beam delivery system for a short-pulse KrF laser used for material ablation [J].

Dainesi, P ;

Ihlemann, J ;

Simon, P .

APPLIED OPTICS, 1997, 36 (27) :7080-7085

[6] NOVEL METHOD FOR MEASURING EXCIMER LASER ABLATION THRESHOLDS OF POLYMERS [J].

DYER, PE ;

JENKINS, SD ;

SIDHU, J .

APPLIED PHYSICS LETTERS, 1988, 52 (22) :1880-1882

[7] SUBMICROMETER PATTERNING BY PROJECTED EXCIMER-LASER-BEAM INDUCED CHEMISTRY [J].

EHRLICH, DJ ;

TSAO, JY ;

BOZLER, CO .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :1-8

[8] EFFECTS OF A SIMULATED HIGH-ENERGY SPACE ENVIRONMENT ON ULTRAVIOLET TRANSMITTANCE OF OPTICAL MATERIALS BETWEEN 1050 A AND 3000 A [J].

HEATH, DF ;

SACHER, PA .

APPLIED OPTICS, 1966, 5 (06) :937-&

[9]

HERMAN PR, 1993, MATER RES SOC SYMP P, V285, P163

[10]

HERMAN PR, 1992, P MATER RES SOC S, V236, P53

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