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NOVEL METHOD FOR MEASURING EXCIMER LASER ABLATION THRESHOLDS OF POLYMERS
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DYER, PE
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JENKINS, SD
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SIDHU, J
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D O I:
10.1063/1.99612
中图分类号:
O59 [应用物理学];
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页码:1880 / 1882
页数:3
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共 10 条
- [1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER[J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719ANDREW, JE论文数: 0 引用数: 0 h-index: 0DYER, PE论文数: 0 引用数: 0 h-index: 0FORSTER, D论文数: 0 引用数: 0 h-index: 0KEY, PH论文数: 0 引用数: 0 h-index: 0
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- [5] SELF-DEVELOPING PHOTORESIST USING A VACUUM ULTRAVIOLET F2 EXCIMER LASER EXPOSURE[J]. APPLIED PHYSICS LETTERS, 1985, 46 (09) : 900 - 902HENDERSON, D论文数: 0 引用数: 0 h-index: 0机构: BELL COMMUN RES,HOLMDEL,NJ 07733WHITE, JC论文数: 0 引用数: 0 h-index: 0机构: BELL COMMUN RES,HOLMDEL,NJ 07733CRAIGHEAD, HG论文数: 0 引用数: 0 h-index: 0机构: BELL COMMUN RES,HOLMDEL,NJ 07733ADESIDA, I论文数: 0 引用数: 0 h-index: 0机构: BELL COMMUN RES,HOLMDEL,NJ 07733
- [6] CONTROLLED MODIFICATION OF ORGANIC POLYMER SURFACES BY CONTINUOUS WAVE FAR-ULTRAVIOLET (185NM) AND PULSED-LASER (193NM) RADIATION - XPS STUDIES[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1984, 106 (15) : 4288 - 4290LAZARE, S论文数: 0 引用数: 0 h-index: 0机构: IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598 IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598HOH, PD论文数: 0 引用数: 0 h-index: 0机构: IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598 IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598BAKER, JM论文数: 0 引用数: 0 h-index: 0机构: IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598 IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598SRINIVASAN, R论文数: 0 引用数: 0 h-index: 0机构: IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598 IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
- [7] SURFACE-PROPERTIES OF POLY(ETHYLENE-TEREPHTHALATE) FILMS MODIFIED BY FAR-ULTRAVIOLET RADIATION AT 193-NM (LASER) AND 185-NM (LOW INTENSITY)[J]. JOURNAL OF PHYSICAL CHEMISTRY, 1986, 90 (10) : 2124 - 2131LAZARE, S论文数: 0 引用数: 0 h-index: 0机构: IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598 IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598SRINIVASAN, R论文数: 0 引用数: 0 h-index: 0机构: IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598 IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
- [8] DIRECT AND ACCURATE MEASUREMENT OF ETCH RATE OF POLYMER-FILMS UNDER FAR-UV IRRADIATION[J]. APPLIED PHYSICS LETTERS, 1987, 50 (10) : 624 - 625LAZARE, S论文数: 0 引用数: 0 h-index: 0SOULIGNAC, JC论文数: 0 引用数: 0 h-index: 0FRAGNAUD, P论文数: 0 引用数: 0 h-index: 0
- [9] SELF-DEVELOPING PHOTOETCHING OF POLY(ETHYLENE-TEREPHTHALATE) FILMS BY FAR ULTRAVIOLET EXCIMER LASER-RADIATION[J]. APPLIED PHYSICS LETTERS, 1982, 41 (06) : 576 - 578SRINIVASAN, R论文数: 0 引用数: 0 h-index: 0MAYNEBANTON, V论文数: 0 引用数: 0 h-index: 0
- [10] ELECTROSTATIC COLLECTION OF DEBRIS RESULTING FROM 193 NM LASER ETCHING OF POLYIMIDE[J]. APPLIED PHYSICS LETTERS, 1987, 51 (01) : 15 - 17VONGUTFELD, RJ论文数: 0 引用数: 0 h-index: 0SRINIVASAN, R论文数: 0 引用数: 0 h-index: 0