ELECTROSTATIC COLLECTION OF DEBRIS RESULTING FROM 193 NM LASER ETCHING OF POLYIMIDE

被引：34

作者：

VONGUTFELD, RJ

SRINIVASAN, R

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 51卷 / 01期

关键词：

D O I：

10.1063/1.98889

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：15 / 17

页数：3

相关论文

共 11 条

[1] EXCIMER LASER ETCHING OF POLYIMIDE
BRANNON, JH
LANKARD, JR
BAISE, AI
BURNS, F
KAUFMAN, J
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043
[2] BRAREN B, UNPUB
[3] VERSATILE MICROSECOND MOVIE CAMERA
DREYFUS, RW
[J]. APPLIED OPTICS, 1980, 19 (06): : 905 - 908
[4] DEVELOPMENT AND ORIGIN OF CONICAL STRUCTURES ON XECL LASER ABLATED POLYIMIDE
DYER, PE
JENKINS, SD
SIDHU, J
[J]. APPLIED PHYSICS LETTERS, 1986, 49 (08) : 453 - 455
[5] MASS SPECTROSCOPIC IDENTIFICATION OF WAVELENGTH DEPENDENT UV LASER PHOTOABLATION FRAGMENTS FROM POLYMETHYLMETHACRYLATE
ESTLER, RC
NOGAR, NS
[J]. APPLIED PHYSICS LETTERS, 1986, 49 (18) : 1175 - 1177
[6] EMISSION-SPECTRA AND ETCHING OF POLYMERS AND GRAPHITE IRRADIATED BY EXCIMER LASERS
KOREN, G
YEH, JTC
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (07) : 2120 - 2126
[7] EMISSION-SPECTRA, SURFACE QUALITY, AND MECHANISM OF EXCIMER LASER ETCHING OF POLYIMIDE FILMS
KOREN, G
YEH, JTC
[J]. APPLIED PHYSICS LETTERS, 1984, 44 (12) : 1112 - 1114
[8] MECHANISM OF THE ULTRAVIOLET-LASER ABLATION OF POLY(METHYL METHACRYLATE AT 193 AND 248 NM - LASER-INDUCED FLUORESCENCE ANALYSIS, CHEMICAL-ANALYSIS, AND DOPING STUDIES
SRINIVASAN, R
BRAREN, B
DREYFUS, RW
HADEL, L
SEEGER, DE
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1986, 3 (05) : 785 - 791
[9] ULTRAVIOLET-LASER ABLATION OF POLYIMIDE FILMS
SRINIVASAN, R
BRAREN, B
DREYFUS, RW
[J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (01) : 372 - 376
[10] SELF-DEVELOPING PHOTOETCHING OF POLY(ETHYLENE-TEREPHTHALATE) FILMS BY FAR ULTRAVIOLET EXCIMER LASER-RADIATION
SRINIVASAN, R
MAYNEBANTON, V
[J]. APPLIED PHYSICS LETTERS, 1982, 41 (06) : 576 - 578