Magnetic and structural properties of Co, Cr, V ion-implanted GaN

被引:96
作者
Lee, JS [1 ]
Lim, JD
Khim, ZG
Park, YD
Pearton, SJ
Chu, SNG
机构
[1] Seoul Natl Univ, Sch Phys, Seoul 151747, South Korea
[2] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[3] Agere Syst, Murray Hill, NJ 07974 USA
关键词
D O I
10.1063/1.1561587
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the magnetic and structural properties of epitaxial metal organic chemical vapor deposition grown p-GaN:Mg/Al2O3 implanted with Co, Cr, and V ions at varying high doses at 350 degreesC. Magnetic and structural properties were investigated after a short anneal at 700 degreesC to remove implantation damage. Magnetic properties determined from superconducting quantum interference device magnetometer measurements indicate ferromagnetic-like ordering for Co and Cr doped samples up to 320 K, while V doped samples show paramagnetic behavior for all temperatures considered. For all samples studied, structural characterization techniques such as x-ray diffraction, high-resolution cross-sectional transmission electron microscopy, and selected area diffraction pattern, indicate no second phases that may contribute to the magnetic properties measured. Transport measurements (resistivity as a function of temperature) reveal all samples to show insulating-like behavior. (C) 2003 American Institute of Physics.
引用
收藏
页码:4512 / 4516
页数:5
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