Kinetics of surface reactions in carbon deposition from light hydrocarbons

被引：35

作者：

Norinaga, K ^{[1
]}

Hüttinger, KJ ^{[1
]}

机构：

[1] Univ Karlsruhe, Inst Chem Tech, D-76128 Karlsruhe, Germany

来源：

CARBON | 2003年 / 41卷 / 08期

关键词：

pyrolytic carbon; chemical vapor deposition; reaction kinetics;

D O I：

10.1016/S0008-6223(03)00097-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Carbon deposition from ethene, ethine and propene as a function of pressure was studied at various temperatures and two different surface area/volume ratios. Deposition rates as a function of pressure of all hydrocarbons indicate Langmuir-Hinshelwood kinetics which suggests that the deposition process is controlled by the heterogeneous surface reactions (growth mechanism). These kinetics are favored at decreasing reactivity (C3H6 >C2H2>C2H4), decreasing temperature and residence time as well as increasing surface area/volume ratio. A linear rate increase at high pressures suggests that carbon is additionally or preferentially deposited by aromatic condensation reactions between polycyclic aromatic hydrocarbons large enough to be physisorbed or condensed on the substrate surface (nucleation mechanism). The results completely agree with earlier results obtained with methane. (C) 2003 Elsevier Science Ltd. All rights reserved.

引用

页码：1509 / 1514

页数：6

共 26 条

[1] Chemistry and kinetics of chemical vapour deposition of pyrocarbon -: VII.: Confirmation of the influence of the substrate surface area/reactor volume ratio [J].

Antes, J ;

Hu, Z ;

Zhang, W ;

Hüttinger, KJ .

CARBON, 1999, 37 (12) :2031-2039

[2] Chemistry and kinetics of chemical vapor deposition of pyrocarbon - V - Influence of reactor volume/deposition surface area ratio [J].

Becker, A ;

Huttinger, KJ .

CARBON, 1998, 36 (03) :225-232

[3] Chemistry and kinetics of chemical vapor deposition of pyrocarbon - IV - Pyrocarbon deposition from methane in the low temperature regime [J].

Becker, A ;

Huttinger, KJ .

CARBON, 1998, 36 (03) :213-224

[4] Chemistry and kinetics of chemical vapor deposition of pyrocarbon - III - Pyrocarbon deposition from propylene and benzene in the low temperature regime [J].

Becker, A ;

Huttinger, KJ .

CARBON, 1998, 36 (03) :201-211

[5] Chemistry and kinetics of chemical vapor deposition of pyrocarbon - II - Pyrocarbon deposition from ethylene, acetylene and 1,3-butadiene in the low temperature regime [J].

Becker, A ;

Huttinger, KJ .

CARBON, 1998, 36 (03) :177-199

[6] Chemistry and kinetics of chemical vapor deposition of pyrolytic carbon from methane [J].

Becker, A ;

Hu, Z ;

Huettinger, KJ .

JOURNAL DE PHYSIQUE IV, 1999, 9 (P8) :41-47

[7] A hydrogen inhibition model of carbon deposition from light hydrocarbons [J].

Becker, A ;

Hu, Z ;

Hüttinger, KJ .

FUEL, 2000, 79 (13) :1573-1580

[8] Chemistry and kinetics of chemical vapour deposition of pyrocarbon .1. Fundamentals of kinetics and chemical reaction engineering [J].

Benzinger, W ;

Becker, A ;

Huttinger, KJ .

CARBON, 1996, 34 (08) :957-966

[9] Chemical vapor infiltration of pyrocarbon - II. The influence of increasing methane partial pressure at constant total pressure on infiltration rate and degree of pore filling [J].

Benzinger, W ;

Huttinger, KJ .

CARBON, 1998, 36 (7-8) :1033-1042

[10] Chemical vapor infiltration of pyrocarbon -: III:: the influence of increasing methane partial pressure at increasing total pressure on infiltration rate and degree of pore filling [J].

Benzinger, W ;

Hüttinger, KJ .

CARBON, 1999, 37 (02) :181-193

← 1 2 3 →