Evaluation of TEM samples of an Mg-Al alloy prepared using FIB milling at the operating voltages of 10 kV and 40 kV

被引:14
作者
Kamino, T
Yaguchi, T
Kuroda, Y
Ohnishi, T
Ishitani, T
Miyahara, Y
Horita, Z
机构
[1] Hitachi Sci Syst Ltd, Hitachinaka, Ibaraki 3120057, Japan
[2] Hitachi High Technol Corp, Hitachinaka, Ibaraki 3120057, Japan
[3] Kyushu Univ, Fac Engn, Dept Mat Sci & Engn, Fukuoka 8128581, Japan
来源
JOURNAL OF ELECTRON MICROSCOPY | 2004年 / 53卷 / 05期
关键词
focused ion beam; FIB micro-sampling technique; Mg-Al alloy; energy dispersive X-ray analyzer; high resolution transmission electron microscopy;
D O I
10.1093/jmicro/dfh058
中图分类号
TH742 [显微镜];
学科分类号
摘要
Transmission electron microscopy (TEM) samples of an Mg-Al alloy has been prepared using a Ga-focused ion beam (FIB) milling at two different operating voltages of 10 kV and 40 kV to investigate the influence of the FIB energy on the sample quality. The fine structures of the samples have been studied using a high resolution TEM, and the concentration of the implanted Ga was analysed using an energy dispersive X-ray (EDX) analysis. The result of the TEM observation revealed that point defects were introduced to the sample finally milled at 40 kV but not at 10 kV. However, crystal lattice images and electron diffraction patterns were clearly observed on both the samples. The typical influence of the FIB energy was indicated in the elemental analysis. The relative Ga concentration in the thin sample finally milled at 10 kV was 1.0-2.0 at% that is less than half of 4.0-6.0 at% of the Ga concentration in the sample finally milled at 40 M A comparison between the experimental results of the Ga concentration measurement with simulation was also discussed.
引用
收藏
页码:459 / 463
页数:5
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