Irradiation-induced defects in Ge studied by transient spectroscopies

被引:122
作者
Fage-Pedersen, J [1 ]
Larsen, AN
Mesli, A
机构
[1] Aarhus Univ, Inst Phys & Astron, DK-8000 Aarhus C, Denmark
[2] CNRS, UPR 292, Lab Phys & Applicat Semicond, F-67037 Strasbourg, France
关键词
D O I
10.1103/PhysRevB.62.10116
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Irradiation-induced impurity-point defect complexes have been investigated in n-type germanium crystals that were doped with either antimony or oxygen. Several majority-carrier traps and one minority-carrier trap are characterized by means of deep-level transient spectroscopy and minority-carrier transient spectroscopy. The antimony-vacancy complex (E center) E-0.37 is found to anneal in a way that is fundamentally different from that in silicon, since it is retarded under reverse bias. Temperature-dependent carrier capture cross sections of the E center are an order of magnitude lower than those of the oxygen-vacancy complex (A center) E-0.27 (sigma (n)similar to1.5X10(-18) and 2X10(-17) cm(2), respectively). A trap E-0.23 which is antimony related grows in at room temperature, seemingly by interstitial capture. A trap E-0.29 is assigned to the divacancy, since it is observed after proton irradiation but not after electron irradiation. A minority-carrier trap H-0.30, displaying a strong Poole-Frenkel effect, is Sb related and possibly related to the E center. In view of the experiments, we comment on a range of diverging results in the literature.
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页码:10116 / 10125
页数:10
相关论文
共 31 条
[21]  
PIGG JC, 1964, PHYS REV, V135, P1141
[22]   CHARACTERISTICS OF THE ELECTRON TRAPS PRODUCED BY ELECTRON-IRRADIATION IN N-TYPE GERMANIUM [J].
POULIN, F ;
BOURGOIN, JC .
PHYSICAL REVIEW B, 1982, 26 (12) :6788-6794
[23]   THRESHOLD ENERGY FOR ATOMIC DISPLACEMENT IN ELECTRON-IRRADIATED GERMANIUM [J].
POULIN, F ;
BOURGOIN, JC .
REVUE DE PHYSIQUE APPLIQUEE, 1980, 15 (01) :15-19
[24]  
Poulin F., 1981, RECENT DEV CONDENSED, P83
[25]   SOLUBILITY OF CARBON IN SILICON AND GERMANIUM [J].
SCACE, RI ;
SLACK, GA .
JOURNAL OF CHEMICAL PHYSICS, 1959, 30 (06) :1551-1555
[26]   Native defects and their interactions with impurities in silicon [J].
Watkins, GD .
DEFECTS AND DIFFUSION IN SILICON PROCESSING, 1997, 469 :139-150
[27]  
WATKINS GD, 1986, DEEP CTR SEMICONDUCT, P147
[28]  
WEBER J, 1998, J APPL PHYS, V1, P1
[29]   OXYGEN-DEFECT COMPLEXES IN NEUTRON-IRRADIATED GERMANIUM [J].
WHAN, RE .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) :2435-&
[30]  
WHAN RE, 1965, PHYS REV A, V140, P690