Oxide thin films for tunable microwave devices

被引:119
作者
Xi, XX
Li, HC
Si, WD
Sirenko, AA
Akimov, IA
Fox, JR
Clark, AM
Hao, JH
机构
[1] Penn State Univ, Dept Phys, University Pk, PA 16802 USA
[2] Chinese Acad Sci, Inst Phys, Natl Lab Superconduct, Beijing 100080, Peoples R China
[3] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
关键词
ferroelectrics; ferrite; thin films; tunable microwave devices;
D O I
10.1023/A:1009903802688
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Oxide thin films have been studied for frequency and phase agile electronics. The electric-field tuning of microwave devices employs ferroelectrics, while the Magnetic-field tuning uses ferrites. The critical material parameters for ferroelectric thin films are the tunability of the dielectric constant and the dielectric loss. This paper describes the current understanding of the fundamental mechanisms of these properties and the research efforts to improve them in ferroelectric thin films.
引用
收藏
页码:393 / 405
页数:13
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