Adhesion and fracture of tantalum nitride films

被引:59
作者
Moody, NR
Hwang, RQ
Venka-Taraman, S
Angelo, JE
Norwood, DP
Gerberich, WW
机构
[1] Univ Minnesota, Minneapolis, MN 55455 USA
[2] Sandia Natl Labs, Albuquerque, NM 87185 USA
关键词
D O I
10.1016/S1359-6454(97)00243-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Indentation fracture and continuous nanoscratch testing were used in this study to determine the effects of compressive residual stresses on the fracture of thin sputter-deposited tantalum nitride films. Some films were tested in the as-deposited condition while others were vacuum annealed at 300 degrees C. The only discernible change in structure was a surface rearrangement of atoms into parallel arrays of striations on the vacuum annealed samples revealing a high compressive residual stress state after deposition. Comparison of results and application of mechanics-based models showed that these stresses had a strong effect on the fracture of the as-deposited films. The models also provided a good measure of the residual stress levels and interfacial strain energy release rates. (C) 1998 Acta Metallurgica Inc.
引用
收藏
页码:585 / 597
页数:13
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