Three decades of molecular beam epitaxy

被引：13

作者：

Foxon, CT ^{[1
]}

机构：

[1] Univ Nottingham, Dept Phys & Astron, Nottingham NG7 2RD, England

来源：

JOURNAL OF CRYSTAL GROWTH | 2003年 / 251卷 / 1-4期

关键词：

molecular beam epitaxy;

D O I：

10.1016/S0022-0248(02)02396-5

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

In this paper I discuss the major developments in molecular beam epitaxy (MBE) over the last three decades, including understanding the growth process and the application of MBE for the production of low-dimensional structures and devices. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：1 / 8

页数：8

共 49 条

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