Valence band structure of GaAsN compounds and band-edge lineup in GaAs/GaAsN/InGaAs heterostructures

被引:4
作者
Egorov, AY
Odnobludov, VA
Mamutin, VV
Zhukov, AE
Tsatsul'nikov, AF
Kryzhanovskaya, NV
Ustinov, VM
Hong, YG
Tu, CW
机构
[1] RAS, AF Ioffe Phys Tech Inst, Phys Semicond Heterostruct, St Petersburg 194021, Russia
[2] Univ Calif San Diego, Dept Elect & Comp Engn, La Jolla, CA 92093 USA
关键词
molecular beam epitaxy; dilute nitride; semiconducting materials;
D O I
10.1016/S0022-0248(02)02368-0
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We report on the further investigation of the fundamental properties of GaAsN compounds and GaAs/GaAsN/InGaAs heterostructures grown by MBE. The strain-induced splitting of light-hole and heavy-hole bands of tensilly strained GaAsN is observed. The presented dependence of the band gap in unstrained GaAsN on the nitrogen content differs substantially from the one predicted by the theory (IEEE J. Sel. Topics Quantum Electron. 3 (1997) 719) assuming that the band gap in GaAsN can be reduced to zero. The space-indirect transition between hole localized in InGaAs and electron localized in GaAsN is detected. The value of the valence band discontinuity between GaAs and GaAsN0.02 at 18 K was evaluated to be 15 +/- 5 meV taking into account the band gap of GaAsN alloy. Band-edge lineup in heterostuctures with GaAsN layer is determined from experimental data. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:417 / 421
页数:5
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