Polymer viscoelasticity and residual stress effects on nanoimprint lithography

被引:69
作者
Ding, Yifu
Ro, Hyun Wook
Douglas, Jack F.
Jones, Ronald L.
Hine, Daniel R.
Karim, Alamgir
Soles, Christopher L.
机构
[1] Natl Inst Stand & Technol, Div Polymers, Gaithersburg, MD 20899 USA
[2] Univ Maryland, Lab Phys Sci, College Pk, MD 20740 USA
关键词
D O I
10.1002/adma.200601998
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The decay kinetics of polystyrene (PS) gratings are monitored by tracking the intensity of the first-order laser diffraction peak as a function of annealing time. For low-molecular-mass PS (24 kg mol(-1), blue circles), an exponential response suggests that the pattern decay is a surface-tension driven viscous flow. In high-molecular-mass PS (1007 kg mol(-1), green circles) a complicated response includes a rapid elastic recovery, a power-law creep, and a viscouslike flow (see figure).
引用
收藏
页码:1377 / +
页数:7
相关论文
共 32 条
[1]  
Andrade END, 1910, P R SOC LOND A-CONTA, V84, P1
[2]   Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography [J].
Austin, MD ;
Ge, HX ;
Wu, W ;
Li, MT ;
Yu, ZN ;
Wasserman, D ;
Lyon, SA ;
Chou, SY .
APPLIED PHYSICS LETTERS, 2004, 84 (26) :5299-5301
[3]   Dewetting modes of thin metallic films: Nucleation of holes and spinodal dewetting [J].
Bischof, J ;
Scherer, D ;
Herminghaus, S ;
Leiderer, P .
PHYSICAL REVIEW LETTERS, 1996, 77 (08) :1536-1539
[4]   Decay kinetics of nanoscale corrugation gratings on polymer surface: Evidence for polymer flow below the glass temperature [J].
Buck, E ;
Petersen, K ;
Hund, M ;
Krausch, G ;
Johannsmann, D .
MACROMOLECULES, 2004, 37 (23) :8647-8652
[5]   Comparison of resist collapse properties for deep ultraviolet and 193 nm resist platforms [J].
Cao, HB ;
Nealey, PF ;
Domke, WD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06) :3303-3307
[6]   The surface tension of polymer liquids [J].
Dee, GT ;
Sauer, BB .
ADVANCES IN PHYSICS, 1998, 47 (02) :161-205
[7]  
Ferry D.J., 1980, Viscoelastic Properties of Polymers, V3e
[8]   Surface-rheological measurements on glass forming polymers based on the surface tension driven decay of imprinted corrugation gratings [J].
Hamdorf, M ;
Johannsmann, D .
JOURNAL OF CHEMICAL PHYSICS, 2000, 112 (09) :4262-4270
[9]   Defect analysis in thermal nanoimprint lithography [J].
Hirai, Y ;
Yoshida, S ;
Takagi, N .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06) :2765-2770
[10]   High aspect pattern fabrication by nano imprint lithography using fine diamond mold [J].
Hirai, Y ;
Yoshida, S ;
Takagi, N ;
Tanaka, Y ;
Yabe, H ;
Sasaki, K ;
Sumitani, H ;
Yamamoto, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (6B) :3863-3866