Self-organization of 3D triangular GaN nanoislands and the shape variation to hexagonal

We report on the self-organization of large-scale uniform aligned three-dimensional (3D) GaN islands with distinct triangular (0001) and smooth side facets and the shape variations of the (0001) facets from triangular to hexagonal during metalorganic vapor-phase epitaxy (MOVPE) growth of GaN films on Si-rich SiNx patterned sapphire substrates. The triangular island shaping during the recrystallization processes of GaN nucleation layers (NLs) can be attributed to the enhanced diffusion and regrowth anisotropy. The island shape transition from triangular to hexagonal in the early stages of high-temperature growth of GaN epilayers is due to the gas-phase transport dominating growth mechanism and the limited diffusion length of edge adatoms compared with the increased island size.