Surface reconstruction phase diagrams for InAs, AlSb, and GaSb

被引:127
作者
Bracker, AS [1 ]
Yang, MJ [1 ]
Bennett, BR [1 ]
Culbertson, JC [1 ]
Moore, WJ [1 ]
机构
[1] USN, Res Lab, Div Elect Sci & Technol, Washington, DC 20375 USA
关键词
molecular beam epitaxy; gallium antimonide; aluminum antimonide; indium arsenide; surface reconstruction;
D O I
10.1016/S0022-0248(00)00871-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We present experimental flux-temperature phase diagrams for surface reconstruction transitions on the 6.1 Angstrom compound semiconductors. The phase transitions occur within or near typical substrate temperature ranges for growth of these materials by molecular beam epitaxy and therefore provide a convenient temperature standard for optimizing growth conditions. Phase boundaries for InAs (001) [(2 x 4) --> (4 x 2)], AlSb (001) [c(4 x 4) --> (1 x 3)], and GaSb (001) [(2 x 5) --> (1 x 3)] are presented as a function of substrate temperature and Group V-limited growth rate (proportional to flux), for both cracked and uncracked Group V species. We discuss differences between materials in the slopes and offsets of the phase boundaries for both types of Group V species. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:384 / 392
页数:9
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