A >400 GHz fmax transferred-substrate heterojunction bipolar transistor IC technology

被引:56
作者
Lee, Q [1 ]
Agarwal, B [1 ]
Mensa, D [1 ]
Pullela, R [1 ]
Guthrie, J [1 ]
Samoska, L [1 ]
Rodwell, MJW [1 ]
机构
[1] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
关键词
HBT; high-speed; InP; transferred-substrate;
D O I
10.1109/55.661170
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report transferred-substrate AlInAs/GaInAs heterojunction bipolar transistors. A device having 0.6 mu m x 25 mu m emitter and a 0.8 mu m x29 mu m collector exhibited f(tau) = 134 GHz and f(max) > 400 GHz. A device with a 0.6 mu m x 25 mu m emitter and a 1.8 mu m x 29 mu m collector exhibited 400 GHz f(max) and 164 GHz f(tau). The improvement in f(max) over previous transferred-substrate HBT's is due to improved base Ohmic contacts, narrower emitter-base and collector-base junction areas, and slightly reduced transit times. The transferred-substrate fabrication process provides electroplated gold thermal vias for transistor heat-sinking and a microstrip wiring environment on a low dielectric constant polymer substrate.
引用
收藏
页码:77 / 79
页数:3
相关论文
共 7 条
[1]   A 277-GHz f(max) transferred-substrate heterojunction bipolar transistor [J].
Agarwal, B ;
Mensa, D ;
Pullela, R ;
Lee, Q ;
Bhattacharya, U ;
Samoska, L ;
Guthrie, J ;
Rodwell, MJW .
IEEE ELECTRON DEVICE LETTERS, 1997, 18 (05) :228-231
[2]   TRANSFERRED SUBSTRATE SCHOTTKY-COLLECTOR HETEROJUNCTION BIPOLAR-TRANSISTORS - FIRST RESULTS AND SCALING LAWS FOR HIGH F(MAX) [J].
BHATTACHARYA, U ;
MONDRY, MJ ;
HURTZ, G ;
TAN, IH ;
PULLELA, R ;
REDDY, M ;
GUTHRIE, J ;
RODWELL, MJW ;
BOWERS, JE .
IEEE ELECTRON DEVICE LETTERS, 1995, 16 (08) :357-359
[3]  
KURISHIMA K, 1995, IEICE T ELECTRON, VE78C, P1171
[4]   Ultrahigh-speed InP/InGaAs double-heterostructure bipolar transistors and analyses of their operation [J].
Matsuoka, Y ;
Yamahata, S ;
Kurishima, K ;
Ito, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1996, 35 (11) :5646-5654
[5]  
PULLELA R, 1997, DEVICE RES C, P2
[6]   TUNNELING BEHAVIOR OF EXTREMELY LOW-RESISTANCE NONALLOYED TI/PT/AU CONTACTS TO N(P)-INGAAS AND N-INAS/INGAAS [J].
STAREEV, G ;
KUNZEL, H .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (12) :7592-7595
[7]   Delay of Kirk effect due to collector current spreading in heterojunction bipolar transistors [J].
Zampardi, PJ ;
Pan, DS .
IEEE ELECTRON DEVICE LETTERS, 1996, 17 (10) :470-472