Factors determining properties of multi-walled carbon nanotubes/fibres deposited by PECVD

This paper presents a number of factors which have been found to be important to the growth of carbon nanotubes and nanofibres by plasma enhanced chemical vapour deposition. The effect of the electric field in a plasma discharge on nanotube growth is investigated and shown to be important in achieving nanotube alignment. The use of a plasma discharge also enables deposition to take place at lower temperatures, facilitating the use of substrates which would otherwise be damaged. The effect of varying the ratio of carbon feedstock gas to etchant gas is investigated and the ratio is shown to be important for controlling the shape of deposited nanostructures. The effects of varying plasma power are investigated, showing that greater plasma power results in a lower growth rate. Higher levels of plasma power are also shown to cause the sidewalls of deposited carbon nanotubes to be etched. Finally, the growth rate of carbon nanotubes and nanofibres is shown to depend upon the strength of the local electric field. It is proposed that a higher field causes greater ionization within the plasma, which results in a higher growth rate. This is borne out by comparing simulation results with experimental observations.